Vacuum Feedthroughs, Heating Elements, and Custom Process Heaters for Semiconductor, OEM Applications and University Research

450mm Vacuum Heater Chuck

450mm - Vacuum Heater Chuck

An atomic layer deposition (ALD) application up to 450°C is the focus of the latest BCE 450mm vacuum heater chuck. The design is a compressed assembly with many vacuum holes and grooves in the bottom plate to allow the gases to escape during the pump down of the vacuum chamber. No surface anodizing is required.

This highly effective vacuum heater reached an atmospheric temperature of 450°C in under 45 minutes (700°C in Stainless). The reduced mass on the bottom plate provides proper gas elimination with a quicker initial ramp time. Due to this decreased ramp time, a reduced wattage may be an option for the future iterations of the 450mm Vacuum Heater Chuck.

Specifications

  • Plate Body : Aluminum 6061
  • Seal Assembly: Stainless Steel
  • Electrical Heating Element: 3,850 Watts (+/- 10%) / 240 Volts
  • Maximum Temperature: 450°C in Vacuum
  • Heater Sheath Transition and Compression Components: Stainless Steel 304
  • Collared Compression Sleeve Brazed in Two Locations
  • 16ra, Surface Finish, No Anodize 

BCE Leads the Way in Design and Development of Semiconductor Wafer Heater Chucks

Download Case Study (PDF)

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